Fabrication series 01 / Flexible neural interfaces

Microfabrication Laboratory

Build a neural electrode, one material layer at a time.

Experiment
Stage 10

Metrology

Remove the carrier geometrically, then inspect the released material and its electrical connectivity.

Preparing specimen…

Drag to orbit · scroll or pinch to zoomReleased specimen
SiliconBase PITop PIMetalResistEtch mask

Material colors and translucency aid inspection. Metal has a minimum visible display thickness; measurements use physical dimensions.

Section A–A′

Through the material stack

Polymer base: 10 µmPatterned conductor: 0.2 µmPatterned conductor: 0.2 µmPatterned conductor: 0.2 µmPatterned conductor: 0.2 µmPolymer planarizing fill: 0.2 µmPolymer planarizing fill: 0.2 µmPolymer planarizing fill: 0.2 µmPolymer planarizing fill: 0.2 µmPolymer planarizing fill: 0.2 µmPolymer encapsulation: 10 µmPolymer encapsulation: 10 µmPolymer encapsulation: 10 µmPolymer encapsulation: 10 µmPolymer encapsulation: 10 µm080160240320AA′width / µm
Select a process step, inspect a section, or change the recipe.

Inspection & electrical probe station

Measure what you made

Current stack height
20.2µm
Exposed electrode area
4,288µm²
Remaining cap in openings
0µm
Continuous, isolated & exposed
—test after release
Channel measurements · select a row to inspect that channel
ChannelExposed areaContinuityIsolationTrace R
1,072 µm²——— Ω
1,072 µm²——— Ω
1,072 µm²——— Ω
1,072 µm²——— Ω

The channel count checks continuity, isolation and nonzero site exposure only. Inspect the process observations for unintended exposure or damaged insulation. Trace resistance excludes electrode–electrolyte impedance; biological performance and chronic reliability are outside this model.

A documented process, an inspectable model

From a mask to a working connection.

This laboratory follows the sequence of a published polyimide microelectrode process. Its four-channel layout and effective process settings are teaching models. The material masks drive all three views and the electrical connectivity tests.

Read the equations, validation cases and source process ↗
  1. 01

    Watch the process

    Replay the reference run. Stop at developed resist, deposited metal, and lift-off to inspect what changes.

  2. 02

    Make one change

    Offset the opening mask or shorten the contact etch. Move the section through an electrode site.

  3. 03

    Find the consequence

    Release, test, and compare the specimen. Save the recipe to repeat exactly the same experiment.